1T-nmemory cell structure and its method of formation and operation

ABSTRACT

A memory array architecture incorporates certain advantages from both cross-point and 1T-1Cell architectures during reading operations. The fast read-time and higher signal to noise ratio of the 1T-1Cell architecture and the higher packing density of the cross-point architecture are both exploited by using a single access transistor to control the reading of multiple stacked columns of memory cells, each column being provided in a respective stacked memory layer.

This application is a continuation-in-part of U.S. patent application Ser. No. 10/214,167, entitled STACKED COLUMNAR 1T-nMJT MRAM STRUCTURE AND ITS METHOD OF FORMATION AND OPERATION, filed Aug. 8, 2002, the entirety of which is hereby incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to memory devices employing memory cell arrays including but not limited to nonvolatile and semi-volatile programmable resistance memory cells such as MRAM and PCRAM, and, more particularly, to read circuitry for memory cells.

BACKGROUND OF THE INVENTION

Integrated circuit designers have always sought the ideal semiconductor memory: a device that is randomly accessible, can be written or read very quickly, is non-volatile, but indefinitely alterable, and consumes little power. Emerging technologies are increasingly viewed as offering these advantages. Some nonvolatile or semi-volatile memory technologies include Magnetoresistive Random Access Memory (MRAM), Programmable Conductor Random Access Memory (PCRAM), Ferroelectric Random Access Memory (FERAM), polymer memory, and chalcogenide memory. Each of these memory types can be employed in stacked arrays of memory cells for increased density.

One type of memory element has a structure which includes ferromagnetic layers separated by a non-magnetic barrier layer that forms a tunnel junction. A typical memory device is described in U.S. Pat. No. 6,359,756 to Sandhu et al., entitled Self-Aligned Magnetoresistive Random Access Memory (MRAM) Structure. Information can be stored as a digital “1” or a “0” as directions of magnetization vectors in these ferromagnetic layers. Magnetic vectors in one ferromagnetic layer are magnetically fixed or pinned, while the magnetic vectors of the other ferromagnetic layer are not fixed so that the magnetization direction is free to switch between “parallel” and “anti-parallel” states relative to the pinned layer. In response to parallel and anti-parallel states, the magnetic memory element represents two different resistance states, which are read by the memory circuit as either a “1” or a “0.” It is the detection of these resistance states for the different magnetic orientations that allows the memory to read binary information.

Recently resistance variable memory elements, which include PCRAM elements, have been investigated for suitability as semi-volatile and non-volatile random access memory devices. A typical PCRAM device is disclosed in U.S. Pat. No. 6,348,365 to Moore et al. In typical PCRAM devices, conductive material, such as silver, is incorporated into a chalcogenide material. The resistance of the chalcogenide material can be programmed to stable higher resistance and lower resistance states. The unprogrammed PCRAM device is normally in a high resistance state. A write operation programs the PCRAM device to a lower resistance state by applying a voltage potential across the chalcogenide material.

The programmed lower resistance state can remain intact for an indefinite period, typically ranging from hours to weeks, after the voltage potentials are removed. The PCRAM device can be returned to its higher resistance state by applying a reverse voltage potential of about the same order of magnitude as used to write the element to the lower resistance state. Again, the higher resistance state is maintained in a semi-volatile manner once the voltage potential is removed. In this way, such a device can function as a resistance variable memory element having two resistance states, which can define two logic states.

A PCRAM device can incorporate a chalcogenide glass comprising germanium selenide (GexSe100−x). The germanium selenide glass may also incorporate silver (Ag) or silver selenide (Ag₂Se). A PCRAM memory element utilizes at least one chalcogenide-based glass layer between two electrodes. For an example of a typical PCRAM cell, refer to U.S. Pat. No. 6,348,365 to Moore et al. A PCRAM cell operates by exhibiting a reduced resistance in response to an applied write voltage. This state can be reversed by reversing the polarity of the write voltage. Like the MRAM, the resistance states of a PCRAM cell can be sensed and read as data. Analog programming states are also possible with PCRAM. MRAM and PCRAM cells can be considered nonvolatile or semi-volatile memory cells since their programmed resistance state can be retained for a considerable period of time without requiring a refresh operation. They have much lower volatility than a conventional Dynamic Random Access Memory (DRAM) cell, which requires frequent refresh operations to maintain a stored logic state.

FERAM, another nonvolatile memory type, utilizes ferroelectric crystals integrated into the memory cells. These crystals react in response to an applied electric field by shifting the central atom in the direction of the field. The voltage required to shift the central atoms of the crystals of the cells can be sensed as programmed data.

Polymer memory utilizes a polymer-based layer having ions dispersed therein or, alternatively, the ions may be in an adjacent layer. The polymer memory element is based on polar conductive polymer molecules. The polymer layer and ions are between two electrodes such that upon application of a voltage or electric field the ions migrate toward the negative electrode, thereby changing the resistivity of the memory cell. This altered resistivity can be sensed as a memory state.

There are different array architectures that are used within memory technology to read memory cells. One architecture which is used is the so-called one transistor—one cell (“1T-1Cell”) architecture. This structure is based on a single access transistor for selecting a memory element for a read operation. Another architecture is the cross-point architecture, where a cell is selected and a read operation performed without using an access transistor. This type of system uses row and column lines set to a predetermined voltage levels to read a selected cell. Each system has its advantages and disadvantages. The cross-point system is somewhat slower in reading than the 1T-1Cell system, as well as having a lower signal to noise ratio during a read operation; however, the cross-point array has the advantage that such arrays can be easily stacked within an integrated circuit for higher density. The 1T-1Cell array is faster, has a better signal to noise ratio, but is less densely integrated than a cross-point array.

It is desirable to have a memory read architecture that could utilize advantages from both the 1T-1Cell and cross-point architectures, while minimizing the disadvantages of each.

SUMMARY

This invention provides a memory array read architecture which incorporates certain advantages from both cross-point and 1T-1Cell architectures. The fast read-time and high signal to noise ratio of the 1T-1Cell architecture and the higher packing density of the cross-point architecture are both exploited in the invention by uniquely combining certain characteristics of each. In an exemplary embodiment, an access transistor is used to select for reading multiple columns of memory cells, which are stacked vertically above one another in a memory slice of a memory array. In this architecture, the plurality of columns of memory cells share a common sense line. A specific memory cell within the multiple columns is accessed by a row and plane address during a read operation.

The invention also provides methods of fabricating memory devices having characteristics noted in the preceding paragraph and methods of operating memory devices to read a selected memory cell.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other features and advantages will become more apparent from the following detailed description of the invention which is provided in conjunction with the accompanying drawings, in which:

FIG. 1 is a two-dimensional cross-sectional view of a portion of a memory array constructed in accordance with an exemplary embodiment of the invention;

FIG. 2 a is a perspective cross-sectional illustration of a portion of a memory array constructed in accordance with the embodiment shown in FIG. 1;

FIG. 2 b is a perspective cross-sectional illustration of a memory slice of a memory array, constructed in accordance with FIG. 2 a;

FIG. 2 c is a perspective cross-sectional illustration of a memory array layer of a memory array, constructed in accordance with FIG. 2 a;

FIG. 2 d is an illustration of a memory column of a memory array, constructed in accordance with FIG. 2 a;

FIG. 3 is a three dimensional block diagram and representational illustration of the FIGS. 1 and 2 a-d memory array;

FIG. 4 is a block diagram and representational illustration of a memory cell showing the interaction between the layers of the cell and other circuitry;

FIG. 5 is a block diagram representation of a processor-based system incorporating a memory device in accordance with the invention;

FIG. 6 is a cross-sectional view of a PCRAM memory cell used in an embodiment of the invention; and

FIG. 7 is a cross-sectional view of a PCRAM memory cell used in another embodiment of the invention.

DETAILED DESCRIPTION

In the following detailed description, reference is made to various specific embodiments in which the invention may be practiced. These embodiments are described with sufficient detail to enable those skilled in the art to practice the invention, and it is to be understood that other embodiments may be employed, and that structural and electrical changes may be made without departing from the spirit or scope of the present invention.

The terms “substrate” and “wafer” can be used interchangeably in the following description and may include any semiconductor-based structure. The structure should be understood to include silicon, silicon-on insulator (SOI), silicon-on-sapphire (SOS), doped and undoped semiconductors, epitaxial layers of silicon supported by a base semiconductor foundation, and other semiconductor structures. The semiconductor need not be silicon-based. The semiconductor could be silicon-germanium, germanium, or gallium arsenide. When reference is made to the substrate in the following description, previous process steps may have been utilized to form regions or junctions in or over the base semiconductor or foundation. Additionally, the substrate need not be semiconductor-based, but may be any structure suitable for supporting a memory array, such as polymer, ceramic, metal, glass, and other materials.

The term “silver” is intended to include not only elemental silver, but silver with other trace metals or in various alloyed combinations with other metals as known in the semiconductor industry, as long as such silver alloy is conductive, and as long as the physical and electrical properties of the silver remain unchanged.

The term “silver-selenide” is intended to include various species of silver-selenide, including some species which have a slight excess or deficit of silver. For example, silver-selenide species may be represented by the general formula Ag_(2+/−x)Se. Though not being limited by a particular stoichiometric ratio between Ag and Se, devices of the present invention typically comprise an Ag_(2+/−x)Se species, where x ranges from about 1 to about 0.

The term “semi-volatile memory” is intended to include any memory device or element which is capable of maintaining its memory state after power is removed from the device for some period of time. Thus, semi-volatile memory devices are capable of retaining stored data after the power source is disconnected or removed. Accordingly, the term “semi-volatile memory” is also intended to include not only semi-volatile memory devices, but also non-volatile memory devices and those of low volatility.

The term “resistance variable material” is intended to include chalcogenide glasses, and chalcogenide glasses comprising a metal, such as silver or metal ions. For instance, the term “resistance variable material” may include silver doped chalcogenide glasses, silver-germanium-selenide glasses, chalcogenide glass comprising a silver selenide layer, and non-doped chalcogenide glass.

The term “chalcogenide glass” is intended to include glasses that comprise an element from group VIA (or group 16) of the periodic table. Group VIA elements, also referred to as chalcogens, include sulfur (S), selenium (Se), tellurium (Te), polonium (Po), and oxygen (O).

This invention relates to low volatility memory technology (e.g., MRAM, PCRAM, FERAM, polymer memory, and chalcogenide memory) and new variations on memory array architecture to incorporate certain advantages from both cross-point and 1T-1Cell architectures. The fast read-time and high signal to noise ratio of the 1T-1Cell architecture and the higher packing density of the cross-point architecture are both exploited by combining certain characteristics of each layout. FIGS. 1 and 2 a-2 d illustrate memory device 100, an exemplary embodiment of the invention in which an array architecture has a plurality of memory arrays 34 stacked one over another. Each array 34 includes a plurality of rows and columns of memory cells. All of the memory cells in the corresponding column in each of the stacked arrays form a memory slice 80 and are coupled to a single access transistor 16 as a group. Although the novel architecture of FIGS. 1 and 2 a-2 d is applicable to any memory device than can utilize either cross-point or 1T-1Cell read architecture and is described generally in relation to such devices (in particular those discussed in the background), the invention is specifically described in relation to MRAM devices for exemplary purposes. In an embodiment of the invention, a PCRAM cell comprises a layer of Ge_(x)Se_(100−x), a layer of silver, and a layer of silver selenide where X is about 40. Although described in reference to Ge_(x)Se_(100−x), the invention is not meant to be so limited.

In FIGS. 1 and 2 a-2 b, an access transistor 16 is used to control the reading of multiple memory cells 38, arranged in columns 81, one from each array layer 34, which are stacked substantially above one another in the “Z” axis direction. The memory cells 38 can be low volatility cells of MRAM, PCRAM, FERAM, polymer memory, chalcogenide memory, or other memory construction. Thus, each access transistor 16 is connected to a substantially vertical stack of columns 81 of memory cells 38 arranged substantially above it. The plurality of columns 81 in this “Y-Z” direction have respective sense lines 33 which are interconnected by virtue of a sense line interconnect 32. This architecture is represented in two-dimensions in FIG. 1 and in three-dimensions in FIG. 2 a, 2 b, 2 c, and 2 d. The “X,” “Y.” and “Z” axes are shown in FIG. 1.

Now referring more specifically to the figures, where like reference numbers designate like elements, FIG. 1 shows a plurality of stacked planar memory cell array layers 34. Each layer 34 has a plurality of memory cells 38 arranged in rows, defined by read/write row lines 44, and columns, defined by sense lines 33 and write only column lines 40. An access transistor layer 12 is fabricated on a semiconductor substrate 10 below the array layers 34. The access transistor layer 12 includes a plurality of access transistors 16 arranged along the “X” axis direction corresponding to the direction in which the row lines 44 extend in each memory array layer 34.

As shown in FIG. 1, the access transistors 16 can be typical N-channel MOSFET (metal oxide semiconductor field effect transistor), though the specific structure of the access transistor 16 is not crucial to the invention. The transistor 16 includes source/drain regions 14 in the substrate 10. Each transistor 16 further includes a gate oxide 18, and over this a polysilicon gate layer 20 with an overlying silicide layer 22, all topped by a nitride cap 24. The polysilicon layer 20 and silicide layer 22 together form a control line 23 which continues in the “X” axis direction in the manner best shown in FIG. 3. The sides of the access transistor 16 control line 23 are insulated and protected by insulating sidewalls 26, made of an oxide or nitride material. In a preferred embodiment, transistors 16 share the control line 23. The control line 23 of the access transistor 16 can be connected to a decoding circuit with peripheral circuitry 48 (depicted in FIG. 4). Access transistor 16 can be fabricated by any techniques well known to those skilled in the art.

Still referring to FIG. 1, an insulating dielectric layer 28 is formed over and around the access transistor 16. Through this insulating dielectric layer 28 conductive plugs 30 are fabricated which connect to the source/drain regions 14. The insulating dielectric 28 can be any material known in the art, such as an oxide or BPSG, and can be formed according to methods well known in the art. The conductive plugs 30 similarly can be any conductive material well known in the art, but preferably are polysilicon or tungsten, and can be formed by known methods. One of the conductive plugs 30 serves to connect one of the source and drain regions 14 to the column sense lines 33 of the stacked memory array layers 34, while the other conductive plug connects the other of the source and drain regions 14 to a sense amplifier 50 used during the reading of memory cells 38. The connections between each access transistor 16 and the memory array layers 34 and the bit lines 31 are typically formed as metal interconnects 36, provided within insulating layer 41. The metal interconnects 36 and bit lines 31 can be copper, aluminum, or any other metal or other conductor known as suitable in the art, and can be formed by known methods.

As further shown in FIG. 2 a, the memory cells 38 are arranged in rows and columns in each array layer 34, and each array layer 34 is arranged in a stacked fashion over substrate 10. Memory cells 38 are arranged in two-dimensional arrays (in the “X, Y” plane) in each array layer 34, where each cell 38 is defined at the intersection of a row read/write line 44 and a column sense line 33, which are orthogonal to each other, as shown in FIGS. 2 a, 2 b, and 2 c. The stacked columns 81 of cells 38 from each array layer 34 form a memory slice 80, that is, a plane of cells in the Y-Z direction, as shown in FIG. 2 b. In the figures a, b, c, d are used to reference structures laid out in the X axis (column) direction, i, j, k, I are used to reference structures laid out in the Y axis (row) direction, and p, q, r are used to reference structures laid out in the Z axis (stacked array 34 direction) direction. Accordingly, the ath memory slice (i.e., memory slice 80 a) is formed by the ath columns 81 of memory cells 38 of each array layer 34. Therefore, memory slices 80 taken in the Y-Z direction are orthogonal to the memory array layers 34 which are formed in the X-Y direction.

Each sense line 33 in a common memory slice 80 is coupled to a plurality of memory cells 38 arranged in a respective column 81 of a layer 34 (FIG. 2 d), in a Y axis direction. This can best be seen in the three-dimensional perspective of FIG. 3. The sense lines 33 for a memory slice 80 are also interconnected by a vertical metal interconnect 32 (FIGS. 1-3). FIG. 1 also shows a write only column line 40 for each column 81 of memory cells 38 in each array 34, which may be provided to assist in writing memory cells 38 when memory cells 38 are MRAM cells. The write only lines 40 are omitted in FIGS. 2 a-d and 3 for clarity, although they are shown in simplified format in FIG. 4. The write only lines 40 would not be necessary in memory schemes other than MRAM, where they are used to produce a crossing magnetic field.

FIG. 3 shows four memory slices 80 arranged in the X axis direction, where each memory slice 80 contains four columns 81 of memory cells 38 stacked in a vertical direction. Each memory slice 80 has an associated access transistor 16, bit line 31 and sense amplifier 50.

Referring to FIG. 4, which shows the memory cell 38 as an exemplary MRAM cell, each cell 38 can include, the common read/write row line 44, used for both the reading and writing functions, a memory region 42, a column sense line 33 used for the reading function, and a column write-only line 40 used for the writing function (again, only for MRAM), which is separated from the sense line 33 by a dielectric layer 46. The memory region 42 includes a free ferromagnetic structure 43, a tunnel junction layer 45, and a pinned ferromagnetic structure 41. In the illustrated embodiment, the free ferromagnetic structure 43 is above the pinned ferromagnetic structure 41, which is adjacent to the sense line 33; however, it is possible to invert the arrangement of the pinned and free ferromagnetic structures as is known in the art.

The memory cells 38 which are coupled through sense lines 33 from respective array layers 34 and share a sense line interconnect 32 are in a memory slice 80 in the “Y-Z” direction, which is vertical relative to the access transistor 16 as shown in FIG. 3. However, other configurations are possible, so long as a plurality of sense lines 33, corresponding to a column 81 of memory cells 38 in each array 34, is connected to the common vertically arranged sense line interconnect 32.

The write-only column line 40 of the (MRAM) memory cell 38 can be composed of conductive materials as known in the art; the particular combination of materials making up the write-only line is not a critical element of the invention; however, as an example this line 40 can be copper or aluminum, and is insulated from other conductive structures by dielectric layer 46. Though shown in segments in FIG. 1, the write-only column lines 40 actually are continuous and travel around the sense line interconnects 32, as shown by the dashed arrows in FIG. 1.

Shown more clearly in FIG. 4, above the write-only line 40 is the sense line 33, which will be further described below, and the magnetic bit (memory region) 42, which is in contact with the common read/write line 44. The pinned ferromagnetic structure 41 includes an associated anti-ferromagnetic layer (not shown), such as iron manganese, which keeps the magnetic orientation of this layer 41 fixed, i.e., “pinned.” The pinned ferromagnetic structure 41 can be formed of layers of ferromagnetic material having good magnetic properties, such as nickel iron cobalt or nickel iron, for instance. The tunnel junction 45 is a non-magnetic region separating the two ferromagnetic structures 41 and 43. The tunnel junction 45 can be made of many materials, as is known in the art, but the preferred material is aluminum oxide. The tunnel junction 45 layer should be thin, smooth and consistent throughout the various memory (e.g., MRAM) cells 38, as is known in the art. Over the tunnel junction 45 is the free ferromagnetic structure 43, which also can be made of a plurality of ferromagnetic layers. Unlike the pinned ferromagnetic structure 41, the free ferromagnetic structure 43 is free to shift its magnetic orientation during the writing of the memory (e.g., MRAM) cell 38 and has no associated anti-ferromagnetic layer. The free ferromagnetic structure 43 is in electrical contact with a common (read/write) row line 44.

Referring again to FIG. 1, a nitride passivation layer is typically provided over the uppermost array layer 34 to protect the memory device. There is no restrictive limit on the number of memory array layers 34 which may be used, other than the practicality of physical size of the ultimate device. In general, ten or more layers 34 are feasible. Of course, a lesser number of layers 34 can also be used. Likewise, the only limit on the number of Y-Z axis memory slices 80 arranged in the X axis direction and the number of memory cells 38 contained in each memory slice 80 is the practicality of physical size of the ultimate device.

In the architecture of the invention, a single access transistor 16 is shared by each of the memory cells 38 within a memory slice 80 in the “Y-Z” planar direction of the stacked layers 34 substantially above the access transistor 16.

Each access transistor 16 can be connected to a corresponding sense amplifier 50 in various ways. For instance, each access transistor 16 can be electrically coupled with a single respective bit line 31 and that bit line 31 can be electrically coupled as one input to a single respective sense amplifier 50 which has another input receiving a reference voltage or, alternatively, multiple bit lines 31 associated with respective access transistors 16 can be electrically coupled through a switch circuit and share a single sense amplifier 50.

During a write operation a memory (e.g., MRAM) cell 38 is addressed by the coinciding activation of the common read/write row line 44 and a write-only column line 40 in a selected array layer 34 associated with that cell 38 by peripheral logic circuitry. Thus, the peripheral logic 48 performs a row, column and array layer decode to select a cell 38 for a writing operation. The actual writing of memory is performed, as is known in the art in the exemplary MRAM, as a function of magnetic moments produced by the electric currents of the common read/write row line 44 and write only column line 40 causing the free ferromagnetic structure 43 to obtain a particular magnetic orientation depending on the direction of current flow through the read/write row line 44 and the write only column line 40.

To read stored information in a memory cell 38, a cell 38 in the Y-Z plane of memory cells is accessed by applying an appropriate voltage to a read/write row line 44 of a selected planar array 34 relative to other read/write row lines 44 in the selected planar array and by activating the access transistor 16 associated with the Y-Z plane (column) of cells containing the selected cell. Thus, a cell 38 in the three-dimensional array (as shown in FIG. 3) is addressed for reading in “X” axis direction by column decode signal which turns on access transistor 16, and in the “Y-Z” planar direction by a selected common read/write row line 44 activated by a row decode signal. A decoded plane address signal selects one of the planar layers 34 to which the decoded row signal is applied.

When turned on, the access transistor 16 connects a sense amplifier 50 (connected to the source/drain 14 of the transistor 16 by the bit line 31) to a sense line interconnect 32 (connected to the other source/drain 14 of the access transistor 16) associated with the sense lines 33 of a memory cell 38 associated with a plurality of columns in the associated memory slice 80 in the “Y-Z” planar direction over that transistor 16. When a cell is read, the sense amplifier 50 connected to the access transistor 16 senses the logic state stored in the read cell as a resistance (or voltage or current depending on the memory type) by any method well known in the art.

Conventional row decoding techniques can be used to activate a read/write line 44 to select a row of memory cells 38 in each array layer 34. Additional address bits are decoded and used to select one of the array layers 34. For the three array layers 34 shown in FIGS. 1, 2 a-c and 3, this would require two additional address bits which can be added to the row or column address bits. During a read, the column addresses are used to select an access transistor 16, corresponding to a memory slice 81. Once the row and column addresses have been received in the memory device, they are decoded to activate an addressed row, column, and array layer 34. As one example, if the memory device is a 16 Mbit array organized as 2048 rows by 2048 columns by 4 layers 34, the memory device would utilize an 11-bit (2¹¹=2048) row address and a 13-bit column address, with 11 of the 13 bits used for a column selection (2¹¹=2048) and the two remaining column bits used for planar array 34 selection (2²=4).

Once a memory cell 38 has been addressed for a read operation, the addressed cell 38 is coupled to one of the inputs of a sense amplifier 50 via a sense line 33, a sense line interconnect 32, an access transistor 16, and a bit line 31. The other input of the sense amplifier 50 is coupled to another one of the non-addressed lines 31 to use as a reference, or to a reference voltage. The sense amplifier 50 senses the resistance of the selected cell 38 connected to one input of the sense amplifier 50 using the other input of the sense amplifier 50 as a reference.

This architecture provides for a transistor driver (the access transistor 16) for the reading function, which is close to both the memory cells 38 and the sense amplifier 50 enabling a faster read function. This arrangement also produces a higher signal to noise ratio during the read function than is provided by a conventional cross-point architecture. In this arrangement, the memory three-dimensional array essentially consists of a 1T-nCell architecture, where n is equal to the number of memory cells 38 in the memory slice 80 in the “Y-Z” planar direction. Accordingly, fewer access transistors 16 are required than is needed in the 1T-1Cell architecture known in the art.

FIG. 6 is a cross-sectional view of a PCRAM memory cell used as the memory cells in the memory device 100 (FIG. 1) constructed in accordance with another exemplary embodiment of the invention. FIG. 6 depicts a conventional structure for a PCRAM memory cell as seen, for example, in U.S. Pat. No. 6,348,365 and U.S. published application No. 2003/0155589, which are incorporated herein by reference in their entirety. As seen in FIG. 6, the PCRAM memory cell includes a semiconductive substrate 610, an insulating material 611, a conductive material 612, dielectric material 613, metal ion-laced glass material 651, metal material 641, and conductive material 661. The semiconductive substrate 610 may be a silicon wafer. The insulating material 611 may be a material such as silicon dioxide. The conductive material 612 may be a material such as tungsten. The dielectric material 613 may be a material such as silicon nitride. The metal ion-laced glass material 651 that serves as an ion conductor may be formed from a glass material, such as Ge_(x)Se_(y), that has been diffused with metal material layer 641 which results in material layer 651 being laced with metal ions.

The metal material 641 may be a material such as silver, tellurium, or copper. Suitable conductive materials that can be used to form electrode or conductive material 661 include those conductive materials that will effectively alloy with the metal material selected to form metal material 641, of which silver is preferred. In the case where silver is used to form conductive material 641, suitable conductive materials for conductive material 661 include tungsten, tantalum, titanium, tantalum nitride, tungsten nitride and so forth. The PCRAM memory cell is formed in accordance with fabrication steps used by those skilled in the art. In an embodiment of the invention, the glass material 651 is formed from Ge_(x)Se_(100−x), where X is about 40. Although described with specific architectures, layers, materials and stoichiometries, the invention is not meant to be so limited.

FIG. 7 is a more detailed cross-sectional view of a PCRAM memory cell 700 used as the memory cells in the memory device 100 (FIG. 1) constructed in accordance with another exemplary embodiment of the invention. The memory cell 700 includes a semiconductor substrate 710, which in the illustrated embodiment is a silicon wafer. A bottom electrode 712 is over the substrate 710. The electrode may be tungsten or nickel. A first glass layer 714 is over the bottom electrode 712. The first glass layer 714 comprises Ge_(x)Se_(100−x), where X is about 40, and is approximately 150 Å thick. A layer of silver (Ag) 716 is provided over the first glass layer 714. The silver layer 716 is approximately 35 Å to approximately 50 Å thick. A silver-selenide (Ag_(2+x)Se) layer 718 is provided over the silver layer 716 and is approximately 470 Å thick.

A second glass layer 720 is provided over the silver-selenide layer 718. The second glass layer 720 comprises Ge_(x)Se_(100−x), where X is about 40, and is approximately 150 Å thick. A second layer of silver (Ag) 722 is provided over the second glass layer 720. The second silver layer 722 is approximately 200 Å thick. A third glass layer 724 is provided over the second silver layer 722. The third glass layer 724 comprises Ge_(x)Se_(100−x), where X is about 40, and is approximately 100 Å thick. A first top electrode 726 is provided over the third glass layer 724. In the illustrated embodiment, the first top electrode 726 does not contain silver and comprises tungsten. A second top electrode 728 is provided over the first top electrode 726. In the illustrated embodiment, the second top electrode 728 does not contain silver and comprises nickel.

A memory array as described above can be formed using conventional processing techniques commonly known in the art. A layer 12 of access transistors, each having a gate and source drain region is formed over a substrate. Sense amplifier circuitry is also formed in the same layer along with other periphery circuitry such as row, column, and plane decoders. The transistor layer is covered by one or more insulating layers 28. Conductive paths are formed through the insulating layer 28 and additional insulating layer 41 is provided over the insulating layer 28. Planar memory array layers 34 are sequentially formed one over another; each layer 34 contains a plurality of rows and columns of memory cells. A conductive path 36, including interconnect 32, is formed from one of one source/drain regions of each transistor 16 to memory cells of stacked columns of cells in a manner commonly known in the art. The memory cells can be formed by different layers of materials as commonly known and discussed above. The other of the source/drain regions is coupled to a sense amplifier 50 by a conductive path 36 formed between the transistor and sense amplifier 50.

FIG. 5 illustrates an exemplary processing system 900, which may utilize a memory device 100 as in FIGS. 1-3. The processing system 900 includes one or more processors 901 coupled to a local bus 904. A memory controller 902 and a primary bus bridge 903 are also coupled the local bus 904. The processing system 900 may include multiple memory controllers 902 and/or multiple primary bus bridges 903. The memory controller 902 and the primary bus bridge 903 may be integrated as a single device 906.

The memory controller 902 is also coupled to one or more memory buses 907. Each memory bus 907 accepts memory components 908, which include at least one memory device 100 constructed in accordance with the present invention. The memory components 908 may be a memory card or a memory module. Examples of memory modules include single inline memory modules (SIMMs) and dual inline memory modules (DIMMs). The memory components 908 may include one or more additional devices 909. For example, in a SIMM or DIMM, the additional device 909 might be a configuration memory, such as a serial presence detect (SPD) memory. The memory controller 902 may also be coupled to a cache memory 905. The cache memory 905 may be the only cache memory in the processing system. Alternatively, other devices, for example, processors 901 may also include cache memories, which may form a cache hierarchy with cache memory 905. If the processing system 900 includes peripherals or controllers, which are bus masters or which support direct memory access (DMA), the memory controller 902 may implement a cache coherency protocol. If the memory controller 902 is coupled to a plurality of memory buses 907, each memory bus 907 may be operated in parallel, or different address ranges may be mapped to different memory buses 907.

The primary bus bridge 903 is coupled to at least one peripheral bus 910. Various devices, such as peripherals or additional bus bridges may be coupled to the peripheral bus 910. These devices may include a storage controller 911, a miscellaneous I/O device 914, a secondary bus bridge 915, a multimedia processor 918, and a legacy device interface 920. The primary bus bridge 903 may also be coupled to one or more special purpose high speed ports 922. In a personal computer, for example, the special purpose port might be the Accelerated Graphics Port (AGP), used to couple a high performance video card to the processing system 900.

The storage controller 911 couples one or more storage devices 913, via a storage bus 912, to the peripheral bus 910. For example, the storage controller 911 may be a SCSI controller and storage devices 913 may be SCSI discs. The I/O device 914 may be any sort of peripheral. For example, the I/O device 914 may be a local area network interface, such as an Ethernet card. The secondary bus bridge may be used to interface additional devices via another bus to the processing system. For example, the secondary bus bridge may be an universal serial port (USB) controller used to couple USB devices 917 via to the processing system 900. The multimedia processor 918 may be a sound card, a video capture card, or any other type of media interface, which may also be coupled to one additional device such as speakers 919. The legacy device interface 920 is used to couple legacy devices, for example, older styled keyboards and mice, to the processing system 900.

The processing system 900 illustrated in FIG. 5 is only an exemplary processing system with which the invention may be used. While FIG. 5 illustrates a processing architecture especially suitable for a general purpose computer, such as a personal computer or a workstation, it should be recognized that well known modifications can be made to configure the processing system 900 to become more suitable for use in a variety of applications. For example, many electronic devices, which require processing may be implemented using a simpler architecture, which relies on a CPU 901, coupled to memory components 908 and/or memory devices 100. These electronic devices may include, but are not limited to audio/video processors and recorders, gaming consoles, digital television sets, wired or wireless telephones, navigation devices (including system based on the global positioning system (GPS) and/or inertial navigation), and digital cameras and/or recorders. The modifications may include, for example, elimination of unnecessary components, addition of specialized devices or circuits, and/or integration of a plurality of devices.

The above description and accompanying drawings are only illustrative of an exemplary embodiment which can achieve the features and advantages of the present invention. For example, although the invention has been described as coupling an access transistor 16 to a sense amplifier 50 by way of a bit line 31, it should be noted that the memory device illustrated may have one sense amplifier 50 associated with each access transistor 16, or one sense amplifier 50 may be shared among access transistors 16 through a suitable decoding and switch arrangement. Other variations in the illustrated architecture are also possible. Thus, while the embodiment of the invention described above is illustrative, it is not intended that the invention be limited to the embodiments shown and described in detail herein. The invention can be modified to incorporate any number of variations, alterations, substitutions, or equivalent arrangements not heretofore described, but which are commensurate with the spirit and scope of the invention. Accordingly, the invention is not limited by the foregoing description but is only limited by the scope of the following claims. 

1-25. (canceled)
 26. A memory device comprising: a plurality of memory slices, each memory slice comprising a plurality of memory cells arranged vertically and horizontally in a plane and which are commonly electrically coupled to a respective sense line interconnect; and a plurality of access transistors, each electrically coupled to a respective sense line interconnect of a memory slice, each access transistor operating during a read operation to couple a selected memory cell in a slice to a sense amplifier.
 27. The memory device of claim 26, wherein each of said memory cells is a programmable conductor random access memory cell.
 28. The memory device of claim 26, wherein each of said memory cells is a ferroelectric random access memory cell.
 29. The memory device of claim 26, wherein each of said memory cells is a polymer memory cell.
 30. The memory device of claim 26, wherein each of said memory cells is a phase-changing chalcogenide memory cell.
 31. The memory device of claim 26, wherein each memory cell has an associated read line.
 32. The memory device of claim 31, wherein during a read operation said read line is selected by a row decoder, said access transistor is selected by a column decoder.
 33. A memory device comprising: a plurality of access transistors each adapted to be electrically coupled with a sense amplifier; a plurality of memory slices, each memory slice comprising a stacked plurality of columns of commonly electrically coupled memory cells, each column of commonly electrically coupled memory cells being electrically coupled to a respective sense line wherein each of said memory cells is a programmable conductor random access memory cell; and a plurality of sense line interconnects, each said sense line interconnect being electrically coupled between a respective access transistor and the sense lines of a respective memory slice.
 34. The memory device of claim 33, further comprising: a plurality of sensing circuits, each said sensing circuit coupling to said respective access transistor.
 35. The memory device of claim 33, further comprising a plurality of read lines respectfully associated with said memory cells for selecting an associated memory cell for a read operation. 36-76. (canceled)
 77. A computer system comprising: a central processing unit; and a memory device electrically coupled to said central processing unit, said memory device comprising: a plurality of memory slices, each memory slice comprising a plurality of memory cells arranged vertically and horizontally in a plane and which are commonly electrically coupled to a respective sense line interconnect, wherein each of said memory cells is a programmable conductor random access memory cell; and a plurality of access transistors, each electrically coupled to a respective sense line interconnect of a memory slice, each access transistor operating during a read operation to couple a selected memory cell in a slice to a sense amplifier.
 78. The computer system of claim 77, wherein each memory cell has an associated read line.
 79. The computer system of claim 78, wherein during a read operation said read line is selected by a row decoder, said access transistor is selected by a column decoder.
 80. A computer system comprising: a central processing unit; and a memory device electrically coupled to said central processing unit, said computer system comprising: a plurality of access transistors each adapted to be electrically coupled with a sense amplifier; a plurality of memory slices, each memory slice comprising a stacked plurality of columns of commonly electrically coupled memory cells, each column of commonly electrically coupled memory cells being electrically coupled to a respective sense line; and a plurality of sense line interconnects, each said sense line interconnect being electrically coupled between a respective access transistor and the sense lines of a respective memory slice.
 81. The computer system of claim 80, further comprising: a plurality of sensing circuits, each said sensing circuit coupling to said respective access transistor.
 82. The computer system of claim 81, further comprising a plurality of read lines respectfully associated with said memory cells for selecting an associated memory cell for a read operation.
 83. The computer system of claim 80, wherein each of said memory cells is a phase changing chalcogenide memory cell.
 84. The computer system of claim 80, wherein each of said memory cells is a polymer memory cell.
 85. The computer system of claim 80, wherein each of said memory cells is a programmable conductor random access memory cell.
 86. The computer system of claim 80, wherein each of said memory cells is a ferroelectric random access memory cell. 